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Reduction of tensile stress in GaN grown on Si(111) by inserting a low-temperature AlN interlayer 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2004, 卷号: 270, 期号: 3-4, 页码: 316-321
Authors:  Zhang BS;  Wu M;  Liu JP;  Chen J;  Zhu JJ;  Shen XM;  Feng G;  Zhao DG;  Wang YT;  Yang H;  Boyd AR;  Zhang, BS, Changchun Univ Sci & Technol, State Key Lab High Power Semicond Lasers, Weixing Rd 7083, Changchun 130022, Peoples R China. 电子邮箱地址: baoshunzhang@126.com
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X-ray Diffraction  
Effect of the N/Al ratio of AlN buffer on the crystal properties and stress state of GaN film grown on Si(111) substrate 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2004, 卷号: 260, 期号: 3-4, 页码: 331-335
Authors:  Wu M;  Zhang BS;  Chen J;  Liu JP;  Shen XM;  Zhao DG;  Zhang JC;  Wang JF;  Li N;  Jin RQ;  Zhu JJ;  Yang H;  Wu, M, Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, POB 912, Beijing 100083, Peoples R China.
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Full-width At Half-maximum  
Influence of high-temperature AIN buffer thickness on the properties of GaN grown on Si(111) 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2003, 卷号: 258, 期号: 1-2, 页码: 34-40
Authors:  Zhang BS;  Wu M;  Shen XM;  Chen J;  Zhu JJ;  Liu JP;  Feng G;  Zhao DG;  Wang YT;  Yang H;  Zhang BS,Chinese Acad Sci,Inst Semicond,State Key Lab Integrated Optoelect,POB 912,Beijing 100083,Peoples R China.
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Metalorganic Chemical Vapor Deposition  Nitrides  Semiconductor Iii-v Materials  Molecular-beam Epitaxy  High-quality Gan  Chemical-vapor-deposition  Intermediate Layer  Alas  Aln  Surfaces  Silicon  Films  
Thickness measurement of GaN epilayer using high resolution X-ray diffraction technique 期刊论文
SCIENCE IN CHINA SERIES G-PHYSICS ASTRONOMY, 2003, 卷号: 46, 期号: 4, 页码: 437-440
Authors:  Feng G;  Zhu JJ;  Shen XM;  Zhang BS;  Zhao DG;  Wang YT;  Yang H;  Liang JW;  Feng G,Chinese Acad Sci,Inst Semicond,State Key Lab Integrated Optoelect,Beijing 100083,Peoples R China.
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Gan  X-ray Diffraction  Thickness  Sapphire  Growth  Films  
High-resolution X-ray diffraction analysis of the Bragg peak integrated intensity in highly mismatched III-N epilayers 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2003, 卷号: 250, 期号: 3-4, 页码: 354-358
Authors:  Feng G;  Shen XM;  Zhu JJ;  Zhang BS;  Zhao DG;  Wang YT;  Yang H;  Liang JW;  Feng G,Chinese Acad Sci,Inst Semicond,State Key Lab Integrated Optoelect,Beijing 100083,Peoples R China.
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X-ray Diffraction  Metalorganic Vapor Phase Epitaxy  Nitrides  Semiconducting Iii-v Materials  Buffer Layer  Gan  Growth  
GaN基MSM结构紫外光探测器 期刊论文
中国科学. G辑, 物理, 2003, 卷号: 33, 期号: 1, 页码: 34-38
Authors:  王俊;  赵德刚;  刘宗顺;  冯淦;  朱建军;  沈晓民;  张宝顺;  杨辉
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GaN外延膜厚度的x射线双晶衍射测量 期刊论文
中国科学. G辑,物理, 2003, 卷号: 33, 期号: 2, 页码: 122-125
Authors:  冯淦;  朱建军;  沈晓明;  张宝顺;  赵德刚;  王玉田;  杨辉;  梁骏吾
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立方相GaN的持续光电导 期刊论文
半导体学报, 2003, 卷号: 24, 期号: 1, 页码: 34-38
Authors:  张泽洪;  赵德刚;  孙元平;  冯志宏;  沈晓明;  张宝顺;  冯淦;  郑新和;  杨辉
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Mechanisms of the sidewall facet evolution in lateral epitaxial overgrowth of GaN by MOCVD 期刊论文
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2002, 卷号: 35, 期号: 21, 页码: 2731-2734
Authors:  Feng G;  Fu Y;  Xia JS;  Zhu JJ;  Zhang BS;  Shen XM;  Zhao DG;  Yang H;  Liang JW;  Feng G,Chinese Acad Sci,Inst Semicond,State Key Lab Integrated Optoelect,Beijing 100083,Peoples R China.
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Vapor-phase Epitaxy  Deposition  Layers  Films  
Crystallographic tilt in GaN layers grown by epitaxial lateral overgrowth 期刊论文
SCIENCE IN CHINA SERIES A-MATHEMATICS PHYSICS ASTRONOMY, 2002, 卷号: 45, 期号: 11, 页码: 1461-1467
Authors:  Feng G;  Zheng XH;  Zhu JJ;  Shen XM;  Zhang BS;  Zhao DG;  Sun YP;  Zhang ZH;  Wang YT;  Yang H;  Liang JW;  Feng G,Chinese Acad Sci,Inst Semicond,State Key Lab Integrated Optoelect,Beijing 100083,Peoples R China.
Adobe PDF(225Kb)  |  Favorite  |  View/Download:927/290  |  Submit date:2010/08/12
Gan  Epitaxial Lateral Overgrowth  Crystallographic Tilt  Double Crystal X-ray Diffraction  Films  Defects  Gaas