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Homoepitaxial growth of multiple 4H-SiC wafers assembled in a simple holder via conventional chemical vapor deposition 期刊论文
Journal of Crystal Growth, 2019, 卷号: 507, 页码: 283-287
Authors:  X.F. Liu ;   G.G. Yan ;   Z.W. Shen ;   Z.X. Wen ;   J. Chen ;   Y.W. He ;   W.S. Zhao ;   L. Wang ;   M. Guan ;   F. Zhang ;   G.S. Sun ;   Y.P. Zeng
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The influence of growth temperature on 4H-SiC epilayers grown on different off-angle (0001) Si-face substrates 期刊论文
Journal of Crystal Growth, 2019, 卷号: 507, 页码: 175-179
Authors:  G.G. Yan ;   X.F. Liu ;   Z.W. Shen ;   W.S. Zhao ;   L. Wang ;   Y.X. Cui ;   J.T. Li ;   F. Zhang ;   G.S. Sun ;   Y.P. Zeng
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Improvement of fast homoepitaxial growth and defect reduction techniques of thick 4H-SiC epilayers 期刊论文
Journal of Crystal Growth, 2019, 卷号: 55, 页码: 1-4
Authors:  G.G. Yan ;   X.F. Liu ;   Z.W. Shen ;   Z.X. Wen ;   J. Chen ;   W.S. Zhao ;   L. Wang ;   F. Zhang ;   X.H. Zhang ;   X.G. Li ;   G.S. Sun ;   Y.P. Zeng ;   Z.G. Wang
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Process optimization for homoepitaxial growth of thick 4H-SiC films via hydrogen chloride chemical vapor deposition 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2018, 卷号: 504, 页码: 7-12
Authors:  X.F. Liu ;   G.G. Yan ;   B. Liu ;   Z.W. Shen ;   Z.X. Wen ;   J. Chen ;   W.S. Zhao ;   L. Wang ;   F. Zhang ;   G.S. Sun ;   Y.P. Zeng
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低偏角碳化硅同质/异质外延生长研究 学位论文
, 北京: 中国科学院半导体研究所, 2016
Authors:  闫果果
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集成傅里叶变换红外原位监测系统的原子层沉积装置 专利
专利类型: 发明, 专利号: CN102492939A, 公开日期: 2012-08-29, 2012-08-29, 2012-08-29
Inventors:  张峰;  孙国胜;  王雷;  赵万顺;  刘兴昉;  闫果果;  曾一平
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连续型HTCVD法碳化硅晶体生长装置 专利
专利类型: 发明, 专利号: CN102304763A, 公开日期: 2012-08-29, 2012-08-29, 2012-08-29
Inventors:  刘兴昉;  郑柳;  董林;  闫果果;  王雷;  赵万顺;  孙国胜;  曾一平;  李晋闽
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HTCVD法碳化硅晶体生长装置 专利
专利类型: 发明, 专利号: CN102304698A, 公开日期: 2012-08-29, 2012-08-29, 2012-08-29
Inventors:  刘兴昉;  董林;  郑柳;  闫果果;  王雷;  赵万顺;  孙国胜;  曾一平;  李晋闽
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碳化硅PIN微结构的制作方法 专利
专利类型: 发明, 专利号: CN102254798A, 公开日期: 2012-08-29, 2012-08-29, 2012-08-29
Inventors:  孙国胜;  吴海雷;  郑柳;  刘兴昉;  王雷;  赵万顺;  闫果果
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一种多片碳化硅半导体材料制造装置 专利
专利类型: 发明, 公开日期: 2016-09-12
Inventors:  闫果果;  孙国胜;  刘兴昉;  张峰;  王雷;  赵万顺;  曾一平
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