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采用TEOS和H_2O源PECVD方法生长氧化硅厚膜(英文) 期刊论文
半导体学报, 2001, 卷号: 22, 期号: 5, 页码: 543
Authors:  雷红兵;  王红杰;  邓晓清;  杨沁清;  胡雄伟;  王启明;  廖左升;  杨基南
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