×
验证码:
换一张
Forgotten Password?
Stay signed in
×
Log In
Chinese
|
English
中国科学院半导体研究所机构知识库
Knowledge Management System Of Institute of Semiconductors,CAS
ALL
ORCID
Title
Creator
Subject Area
Keyword
Document Type
Source Publication
Indexed By
Publisher
Date Issued
Date Accessioned
Funding Project
MOST Discipline Catalogue
Study Hall
Image search
Paste the image URL
Home
Collections
Authors
DocType
Subjects
K-Map
News
Search in the results
Collection
中国科学院半导体研究... [1]
Authors
李艳 [1]
伊晓燕 [1]
Document Type
Patent [1]
Date Issued
2008 [1]
Language
中文 [1]
Source Publication
Funding Project
Indexed By
Funding Organization
×
Knowledge Map
SEMI OpenIR
Start a Submission
Submissions
Unclaimed
Claimed
Attach Fulltext
Bookmarks
QQ
Weibo
Feedback
(Note: the search results are based on claimed items)
Browse/Search Results:
1-1 of 1
Help
Filters
Author：李艳
First author
Selected(
0
)
Clear
Items/Page:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
Sort:
Select
Title Ascending
Title Descending
WOS Cited Times Ascending
WOS Cited Times Descending
Author Ascending
Author Descending
Journal Impact Factor Ascending
Journal Impact Factor Descending
Issue Date Ascending
Issue Date Descending
Submit date Ascending
Submit date Descending
低损伤PECVD沉积致密SiO2的方法
专利
专利类型: 发明, 申请日期: 2008-05-07, 公开日期: 2009-06-04, 2009-06-11
Inventors:
陈宇
;
王良臣
;
伊晓燕
;
李艳
Adobe PDF(386Kb)
|
Favorite
|
View/Download：1689/257
|
Submit date：2009/06/11
