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对砷化铝/砷化镓的砷化镓高选择比化学腐蚀液 专利
专利类型: 发明, 申请日期: 2006-07-05, 公开日期: 2009-06-04, 2009-06-11
发明人:  黄应龙;  杨富华;  王良臣;  姜磊;  白云霞;  王莉
Adobe PDF(207Kb)  |  收藏  |  浏览/下载：1322/204  |  提交时间：2009/06/11
一种竖直式高温大功率碳化硅外延材料制造装置 专利
专利类型: 发明, 申请日期: 2006-01-11, 公开日期: 2009-06-04, 2009-06-11
发明人:  孙国胜;  王雷;  赵万顺;  曾一平;  李晋闽
Adobe PDF(1125Kb)  |  收藏  |  浏览/下载：1003/150  |  提交时间：2009/06/11
降低磷离子注入（0001）取向的4H-碳化硅电阻率的方法 专利
专利类型: 发明, 申请日期: 2006-01-04, 公开日期: 2009-06-04, 2009-06-11
发明人:  高欣;  孙国胜;  李晋闽;  王雷;  赵万顺
Adobe PDF(499Kb)  |  收藏  |  浏览/下载：1329/188  |  提交时间：2009/06/11
Lateral intersubband photocurrent study on InAs/InAlas/InP self-assembled nanostructures 会议论文
International Journal of Nanoscience丛书标题: International Journal of Nanoscience Series, Beijing, PEOPLES R CHINA, NOV 24-27, 2004
作者:  Lei W;  Chen YH;  Jin P;  Xu B;  Ye XL;  Wang ZG;  Huang XQ;  Lei, W, Acad Sinica, Inst Semicond, Key Lab Semicond Mat Sci, POB 912, Beijing 100083, Peoples R China.
Adobe PDF(340Kb)  |  收藏  |  浏览/下载：1460/261  |  提交时间：2010/03/29
Lateral Intersubband Photocurrent  
Monte Carlo simulation of the modulated effect induced by the dislocation to the quantum dot growth 会议论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, Beijing, PEOPLES R CHINA, SEP 13-19, 2005
作者:  Zhao C;  Chen YH;  Zhao M;  Zhang CL;  Xu B;  Yu LK;  Sun J;  Lei W;  Wang ZG;  Zhao, C, Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, POB 912, Beijing 100083, Peoples R China. 电子邮箱地址: czhao@semi.ac.cn
Adobe PDF(330Kb)  |  收藏  |  浏览/下载：1710/335  |  提交时间：2010/03/29
Monte Carlo Simulation  
无权访问的条目 期刊论文
作者:  Zhao L (Zhao Lei);  Zuo YH (Zuo Yuhua);  Cheng BW (Cheng Buwen);  Yu JZ (Yu Jinzhong);  Wang QM (Wang Qiming);  Zhao, L, Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China. E-mail: leizhao@semi.ac.cn
Adobe PDF(342Kb)  |  收藏  |  浏览/下载：1331/286  |  提交时间：2010/04/11
无权访问的条目 期刊论文
作者:  Liu XF (Liu Xing-Fang);  Sun GS (Sun Guo-Sheng);  Li JM (Li Jin-Min);  Zhao YM (Zhao Yong-Mei);  Li JY (Li Jia-Ye);  Wang L (Wang Lei);  Zhao WS (Zhao Wan-Shun);  Zeng YP (Zeng Yi-Ping);  Liu, XF, Chinese Acad Sci, Inst Semicond, Novel Semicond Mat Lab, Beijing 100083, Peoples R China. E-mail: liuxf@mail.semi.ac.cn
Adobe PDF(580Kb)  |  收藏  |  浏览/下载：1333/335  |  提交时间：2010/04/11
无权访问的条目 期刊论文
作者:  Zhao L (Zhao Lei);  Chen YH (Chen Yong-hai);  Zuo YH (Zuo Yu-hua);  Wang HN (Wang Hai-ning);  Shi WH (Shi Wen-hua);  Zhao, L, Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China.
Adobe PDF(391Kb)  |  收藏  |  浏览/下载：1151/367  |  提交时间：2010/04/11
Homoepitaxial growth and characterization of 4H-SiC epilayers by low-pressure hot-wall chemical vapor deposition 会议论文
Silicon Carbide and Related Materials 2005丛书标题: MATERIALS SCIENCE FORUM, Pittsburgh, PA, SEP 18-23, 2005
作者:  Sun, GS (Sun, Guosheng);  Ning, J (Ning, Jin);  Gong, QC (Gong, Quancheng);  Gao, X (Gao, Xin);  Wang, L (Wang, Lei);  Liu, XF (Liu, Xingfang);  Zeng, YP (Zeng, Yiping);  Li, JM (Li, Jinmin);  Sun, GS, Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China.
Adobe PDF(981Kb)  |  收藏  |  浏览/下载：1368/203  |  提交时间：2010/03/29
Homoepitaxial Growth  Low-pressure Hot-wall Cvd  Structural And Optical Characteristics  Intentional Doping  Schottky Barrier Diodes  
无权访问的条目 期刊论文
作者:  Zhao C (Zhao C.);  Chen YH (Chen Y. H.);  Zhao M (Zhao Man);  Zhang CL (Zhang C. L.);  Xu B (Xu B.);  Yu LK (Yu L. K.);  Sun J (Sun J.);  Lei W (Lei W.);  Wang ZG (Wang Z. G.);  Zhao, C, Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, POB 912, Beijing 100083, Peoples R China. E-mail: czhao@semi.ac.cn
Adobe PDF(330Kb)  |  收藏  |  浏览/下载：929/292  |  提交时间：2010/04/11