Mode analysis of the UV-written channel waveguide - art. no. 60340J

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	Mode analysis of the UV-written channel waveguide - art. no. 60340J
	Xia JL; Wu YD; An JM; Li J; Gao DS; Hu XW; Xia, JL, Chinese Acad Sci, Inst Semicond, Res & Dev, Ctr Optoelect, Beijing 100083, Peoples R China.
	2006
会议名称	20th Congress of the International-Commission-for-Optics
会议录名称	ICO20 Optical Design and Fabrication丛书标题: PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE)
页码	6034: J340-J340
会议日期	AUG 21-26, 2005
会议地点	Changchun, PEOPLES R CHINA
出版地	1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA
出版者	SPIE-INT SOC OPTICAL ENGINEERING
ISSN	0277-786X
ISBN	0-8194-6063-X
部门归属	chinese acad sci, inst semicond, res & dev, ctr optoelect, beijing 100083, peoples r china
摘要	The effective index method (EIM) was adopted to model the channel waveguide patterned by the UV in photosensitive silica film. The effective indexes of the different dimension symmetrical and asymmetrical channel waveguides were calculated, and the resource of the error of the method was pointed out. At last, the dimension rang to propagate single mode was presented.
关键词	Uv-written
学科领域	光电子学
主办者	Int Commiss Opt.; Chinese Opt Soc.; Changchun Inst Opt, Fine Mech & Phys, CAS.; AFOSR Asia Off.; Chinese Acad Engn.; Chinese Acad Sci & Technol.; European Opt Soc.; IEEE LEOS.; Natl Nat Sci Fdn China.; Opt Soc Japan.; Opt Soc Korea.; Opt Soc Russia, Siberian.; Opt Soc Amer.; SPIE.
收录类别	其他
语种	英语
文献类型	会议论文
条目标识符	http://ir.semi.ac.cn/handle/172111/9886
专题	中国科学院半导体研究所（2009年前）
通讯作者	Xia, JL, Chinese Acad Sci, Inst Semicond, Res & Dev, Ctr Optoelect, Beijing 100083, Peoples R China.
推荐引用方式 GB/T 7714	Xia JL,Wu YD,An JM,et al. Mode analysis of the UV-written channel waveguide - art. no. 60340J[C]. 1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA:SPIE-INT SOC OPTICAL ENGINEERING,2006:6034: J340-J340.

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