SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
用磁控溅射法在镓砷衬底上外延生长铟砷锑薄膜的方法
彭长涛; 陈诺夫; 吴金良; 尹志冈; 杨霏
2006-11-22
Date Available2009-06-04 ; 2009-06-11
Subtype发明
Application Date2005-05-19
Language中文
Application Number200510011741
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/3533
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
彭长涛,陈诺夫,吴金良,等. 用磁控溅射法在镓砷衬底上外延生长铟砷锑薄膜的方法[P]. 2006-11-22.
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