SEMI OpenIR
硅基 I-V族材料外延及界面缺陷研究
程焜
Subtype硕士
2024-05
Degree Grantor中国科学院大学
Place of Conferral中国科学院半导体研究所
Language中文
Date Available2024-06
Document Type学位论文
Identifierhttp://ir.semi.ac.cn/handle/172111/31780
Collection中国科学院半导体研究所
Recommended Citation
GB/T 7714
程焜. 硅基 I-V族材料外延及界面缺陷研究[D]. 中国科学院半导体研究所. 中国科学院大学,2024.
Files in This Item:
File Name/Size DocType Version Access License
GK2024131-硅基 I-V族材料外(7883KB)学位论文 限制开放CC BY-NC-SAApplication Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[程焜]'s Articles
Baidu academic
Similar articles in Baidu academic
[程焜]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[程焜]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.