SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
一种去除熔体表面浮渣的技术
焦景华; 佘辉; 叶式中
1990-10-31
Date Available2009-06-04 ; 2009-06-11
Subtype发明
Application Date1990-06-15
Language中文
Application NumberCN90104283.8
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/2815
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
焦景华,佘辉,叶式中. 一种去除熔体表面浮渣的技术[P]. 1990-10-31.
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