高性能硅基锗光电探测器的研制 | |
薛海韵 | |
学位类型 | 博士 |
导师 | 成步文 |
2011 | |
学位授予单位 | 中国科学院研究生院 |
学位授予地点 | 北京 |
学位专业 | 物理电子学 |
关键词 | 硅基光子学 硅基锗光电探测器 吸收区倍增区分离的雪崩光电二极管 共振腔增强型 波导型 |
其他摘要 | 在信息产业、生物医学等科技领域越来越受关注的今天,新型光电子、光通信科技必将以更快的速度发展。Si基光电子集成采用成熟价廉的微电子加工工艺,将光学器件与多种功能的微电子电路集成,是实现光通信普及发展和光互连的有效途径。Si基光电探测器是Si基光通信系统的关键器件之一。随着近年来Si基Ge材料外延技术的突破性进展,Si基Ge光电探测器因为兼顾了Si基光电子集成和对光通讯波段(1.31和1.55μm)的高效探测,成为了当今研究的一大热点。 1. 成功研制了PIN型Ge-on-Si光电探测器,器件在-1V外加偏压下暗电流密度为46.6mA/cm2,在1.31μm和1.55μm波长下器件的量子效率分别为40%和17%;然后改进了实验方法,在制作器件之前将Ge-on-Si材料在850℃条件下快速退火1分钟,从而改善材料质量,器件的暗电流密度降低至4mA/cm2,这是目前国际上报道的最好结果之一。 2. 研制出了PIN型Ge-on-SOI光电探测器,在1.31μm和1.55μm波长的量子效率分别为62%和25%。在-3V外加偏压下,器件的3dB带宽为12.6GHz。25μm直径器件,3dB带宽更是达到了13.4GHz。同时,制作了均匀性很好的1×4探测器阵列,单个器件的3dB带宽达13.3GHz。 3. 在国际上首次研究了硅基锗光电探测器的高饱和特性。在-1V和-2V外加偏压下,探测器的1-dB小信号压缩电流分别为22mA和40mA,相应的光功率分别为67.5mW和110.5mW。 4. 成功研制了吸收区和倍增区分离的Si基Ge雪崩光电二极管,器件的穿通电压Vpt约为29V,击穿电压Vbd(暗电流等于100μA时的电压)为39.5V。在击穿电压附近,如39V时,SACM-Ge-on-Si APD的增益为40。 5. 解决了背面ICP深刻蚀工艺难题,成功制备了中心波长在1.55μm,量子效应高达62%的共振腔增强型Si基Ge光电探测器。 提出一种横向波导型结构Ge-on-SOI光电探测器结构,并对该结构探测器进行了理论计算。;Optoelectronics and optical communication technology has developed rapidly as the information industry and bio-medical technology becoming increasingly important. Silicon-based optoelectronic integrated technology is low-cost but effective on achieving popularization and development of optical communication. Silicon-based photodetector is one of the key devices of optical communication system. The Ge-on-Si photodetector has breakthrough progress recently and become the research focus, because it can response to 1.31μm and 1.55μm well. 1. A PIN Ge-on-Si photodetector successfully developed.The dark current density of the device was 46.6mA/cm2 at -1V bias voltage. The quantum efficiency was 40% and 17% at 1.31μm and 1.55μm ; RTA was proposed to decrease the dark current of the Ge-on-Si photodetector.The as-grown Ge-on-Si materials were annealed at 850℃ for 1 minute to reduce the dislocation density.The dark current density of device was 4mA/cm2 at -1V bias voltage,which was the one of best reported results around the world. 2. A PIN Ge-on-SOI photodetector was achived successfully. The corresponding quantum efficiency was 62% and 25% at 1.31μm and 1.55μm,respectively. The 3dB bandwidths of the 30-μm-diameter device was 12.6GHz at reversebias values of 3V.Especially,the 3dB bandwidth of 25-μm-diameter device was 13.4GHz at 1.55μm.At the same time,1×4 Ge-on-SOI PIN photodetector arrays were achived.The four devices in the same array show a good consistency. At the reverse bias of 3V, the bandwidth of the single device was about 13.3GHz. 3. The high saturation power characteristics of Ge-on-Si photodetector was reported for the first time. The 1-dB small-signal compression optical currents were 22mA and 40mA of the 70-μm-diameter device,and the corresponding optical power values were 67.5mW and 110.5mW at reverse-bias of 1 and 2V. 4. Separate Absorption, Charge and Multiplication(SACM) Si-based Ge Avalanche photodetector has been achieved. Its punchthrough voltage was about 29V, breakthrough voltage was 39.5V. The APD exhibited a gain of 40 at 1.31μm and 39V. 5. Using ICP back deep etching technology,the Resonant Cavity Enhanced(RCE) Ge-on-Si photodector was fabricated with a quantum efficiency of 62% at center wavelength of 1.55μm. 6. A lateral waveguide structure Ge-on-SOI photodetector has been designed. Some results of theoretical modeling was described in this thesis. |
学科领域 | 半导体物理 ; 半导体器件 ; 光电子学 |
语种 | 中文 |
公开日期 | 2011-06-01 |
文献类型 | 学位论文 |
条目标识符 | http://ir.semi.ac.cn/handle/172111/20714 |
专题 | 集成光电子学国家重点实验室 |
推荐引用方式 GB/T 7714 | 薛海韵. 高性能硅基锗光电探测器的研制[D]. 北京. 中国科学院研究生院,2011. |
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