Effect of rapid thermal annealing on electron emission and DX centers in strained InGaAs/GaAs single quantum well laser diodes
Lu LW; Zhang YH; Xu ZT; Xu ZY; Wang ZG; Wang J; Ge WK; Lu LW Chinese Acad Sci Inst Semicond Lab Semicond Mat Sci Beijing 100083 Peoples R China.
2000
会议名称11th International Semiconducting and Insulating Materials Conference (SIMC-XI)
会议录名称SIMC-XI: 2000 INTERNATIONAL SEMICONDUCTING AND INSULATING MATERIALS CONFERENCE, PROCEEDINGS
页码341-344
会议日期JUL 03-07, 2000
会议地点CANBERRA, AUSTRALIA
出版地345 E 47TH ST, NEW YORK, NY 10017 USA
出版者IEEE
ISBN0-7803-5815-5
部门归属chinese acad sci, inst semicond, lab semicond mat sci, beijing 100083, peoples r china
摘要nThermal processing of strained ln(0.2)Ga(0.8)As/GaAs graded-index separate confinement heterostructure single quantum well laser diodes grown by molecular beam epitaxy is investigated. It was found that rapid thermal annealing can improve the 77 K photoluminescence efficiency and electron emission from the active layer, due to removal of nonradiative centers from the InGaAs/GaAs interface. Because of the interdiffusion of Al and Ga atoms, rapid thermal annealing increases simultaneously the density of DX centers in the AlGaAs graded layer. The current stressing experiments of post-growth and annealed laser diodes are indicative of a corresponding increase in the concentration of DX centers, suggesting that DX centers may be responsible for the degradation of laser diode performance.
学科领域半导体物理
主办者IEEE Electron Devices Soc.; Australian Natl Univ.; AIXTRON.; Oxford Instruments Plasma Technol.; Ledex Corp.; IEEE ACT Sect.; IEEE Electron Devices Soc, Australian Chapter.; Lasers & Electro-Opt Soc.; Australian Mat Res Soc.
收录类别CPCI-S
语种英语
文献类型会议论文
条目标识符http://ir.semi.ac.cn/handle/172111/14917
专题中国科学院半导体研究所(2009年前)
通讯作者Lu LW Chinese Acad Sci Inst Semicond Lab Semicond Mat Sci Beijing 100083 Peoples R China.
推荐引用方式
GB/T 7714
Lu LW,Zhang YH,Xu ZT,et al. Effect of rapid thermal annealing on electron emission and DX centers in strained InGaAs/GaAs single quantum well laser diodes[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2000:341-344.
条目包含的文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
2904.pdf(245KB) 限制开放--请求全文
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Lu LW]的文章
[Zhang YH]的文章
[Xu ZT]的文章
百度学术
百度学术中相似的文章
[Lu LW]的文章
[Zhang YH]的文章
[Xu ZT]的文章
必应学术
必应学术中相似的文章
[Lu LW]的文章
[Zhang YH]的文章
[Xu ZT]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。