Bandpass filter by a stretch and double-exposure technique

SEMI OpenIR > 中国科学院半导体研究所（2009年前）

	Bandpass filter by a stretch and double-exposure technique
	Zhou KM; An G; Ge H; Wang W; Zhang L; Bennion I; Zhou KM Chinese Acad Sci Inst Semicond Natl Res Ctr Optoelect Technol Beijing 100083 Peoples R China.
	1998
会议名称	Conference on Fiber Optics Components and Optical Communication II
会议录名称	FIBER OPTIC COMPONENTS AND OPTICAL COMMUNICATIONS II, 3552
页码	49-54
会议日期	SEP 18-19, 1998
会议地点	BEIJING, PEOPLES R CHINA
出版地	1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA
出版者	SPIE-INT SOC OPTICAL ENGINEERING
ISSN	0277-786X
ISBN	0-8194-3013-7
部门归属	chinese acad sci, inst semicond, natl res ctr optoelect technol, beijing 100083, peoples r china
摘要	We fabricated a bandpass filter based on Moire Bragg grating in fiber with a uniform phase mask We employed a stretch and two-exposure technique, in which the fiber was exposed to UV light from a KrF excimer through a phase mask and then the fiber is stretched and given another exposure at the same region. Due to the stretch, the periods of these two grating are slightly different, and there is a transmission between two reflection peaks at the Bragg wavelength of these two gratings.Applying different stretch can control the bandpass width of the filter. We measured the stretch characterization of a uniform Bragg grating and found the Bragg wavelength of the grating shifts linearly with the stretched length.We theoretically analyzed the grating structure and its reflection spectrum. The filter's characteristics can be optimized by choosing appropriate parameters. We will give a theoretical discussion concerning which parameters and how they affect the filter's operation.
学科领域	光电子学
主办者	SPIE Int Soc Opt Engn.; COS.; COEMA.
收录类别	CPCI-S
语种	英语
文献类型	会议论文
条目标识符	http://ir.semi.ac.cn/handle/172111/13847
专题	中国科学院半导体研究所（2009年前）
通讯作者	Zhou KM Chinese Acad Sci Inst Semicond Natl Res Ctr Optoelect Technol Beijing 100083 Peoples R China.
推荐引用方式 GB/T 7714	Zhou KM,An G,Ge H,et al. Bandpass filter by a stretch and double-exposure technique[C]. 1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA:SPIE-INT SOC OPTICAL ENGINEERING,1998:49-54.

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