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Transport phenomena in radial flow MOCVD reactor with three concentric vertical inlets 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2006, 卷号: 293, 期号: 2, 页码: 498-508
Authors:  Zuo R (Zuo Ran);  Zhang H (Zhang Hong);  Liu XL (Liu Xiang-lin);  Zuo, R, Jiangsu Univ, Sch Energy & Power Engn, Zhenjiang 212013, Jiangsu, Peoples R China. E-mail: rzuo@ujs.edu.cn
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Flow Recirculation  Numerical Modeling  Reactor  Transport Process  Mocvd  Thin Film Growth  Chemical-vapor-deposition  Phase Epitaxy  Movpe Reactor  Growth  Design  Gan  
行星式化学气相沉积反应器内对流涡旋的数值模拟 期刊论文
工程热物理学报, 2005, 卷号: 26, 期号: 4, 页码: 671-673
Authors:  左然;  张红;  刘祥林
Adobe PDF(661Kb)  |  Favorite  |  View/Download:799/232  |  Submit date:2010/11/23
径向三重流MOCVD反应器输运过程的数值模拟 期刊论文
半导体学报, 2005, 卷号: 26, 期号: 5, 页码: 977-982
Authors:  左然;  张红;  刘祥林
Adobe PDF(620Kb)  |  Favorite  |  View/Download:716/311  |  Submit date:2010/11/23