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Influence of AlGaN Buffer Growth Temperature on GaN Epilayer based on Si(111) Substrate 会议论文
3RD INTERNATIONAL PHOTONICS AND OPTOELECTRONICS MEETINGS (POEM 2010), 276: Art. No. 012094 2011, Wuhan, PEOPLES R CHINA, NOV 02-05, 2010
Authors:  Wei M (Wei Meng);  Wang XL (Wang Xiaoliang);  Pan X (Pan Xu);  Xiao HL (Xiao Hongling);  Wang CM (Wang Cuimei);  Zhang ML (Zhang Minglan);  Wang ZG (Wang Zhanguo)
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Growth of GaN film on Si (111) substrate using AlN sandwich structure as buffer 会议论文
JOURNAL OF CRYSTAL GROWTH, 318 (1): 464-467, Beijing, PEOPLES R CHINA, AUG 08-13, 2010
Authors:  Pan X (Pan Xu);  Wei M (Wei Meng);  Yang CB (Yang Cuibai);  Xiao HL (Xiao Hongling);  Wang CM (Wang Cuimei);  Wang XL (Wang Xiaoliang)
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Simulation of electrical properties of InxAl1- XN/AlN/GaN high electron mobility transistor structure 期刊论文
Journal of Semiconductors, 2011, 卷号: 32, 期号: 8, 页码: 83003
Authors:  Bi, Yang;  Wang, Xiaoliang;  Xiao, Hongling;  Wang, Cuimei;  Yang, Cuibai;  Peng, Enchao;  Lin, Defeng;  Feng, Chun;  Jiang, Lijuan,;  Bi, Y.(ybi@semi.ac.cn)
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Aluminum  Electron Mobility  Gallium Nitride  High Electron Mobility Transistors  Indium  Poisson Equation  Polarization  Two Dimensional Electron Gas  
The influence of the1st AlN and the2nd GaN layers on properties of AlGaN/2nd AlN/2nd GaN/1st AlN/1st GaN structure 期刊论文
Applied Physics A: Materials Science and Processing, 2011, 卷号: 104, 期号: 4, 页码: 1211-1216
Authors:  Bi, Yang;  Wang, XiaoLiang;  Yang, CuiBai;  Xiao, HongLing;  Wang, CuiMei;  Peng, EnChao;  Lin, DeFeng;  Feng, Chun;  Jiang, LiJuan,;  Bi, Y.(ybi@semi.ac.cn)
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Poisson Equation  
High quality GaN-based LED epitaxial layers grown in a homemade MOCVD system 期刊论文
Journal of Semiconductors, 2011, 卷号: 32, 期号: 3, 页码: 33002
Authors:  Yin, Haibo;  Wang, Xiaoliang;  Ran, Junxue;  Hu, Guoxin;  Zhang, Lu;  Xiao, Hongling;  Li, Jing;  Li, Jinmin;  Yin, H.(hbyin@semi.ac.cn)
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Epitaxial Growth  Gallium Nitride  
Theoretical investigation of efficiency of a p-a-SiC: H/i-a-Si: H/n-μ c-Si solar cell 期刊论文
Journal of Semiconductors, 2010, 卷号: 31, 期号: 10, 页码: 103003-1-103003-5
Authors:  Deng Qingwen;  Wang Xiaoliang;  Xiao Hongling;  Ma Zeyu;  Zhang Xiaobin;  Hou Qifeng;  Li Jinmin;  Wang Zhanguo
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用于金属有机物化学沉积设备的扇形进气喷头 专利
专利类型: 发明, 专利号: CN201010033960.X, 公开日期: 2011-08-31, 2011-08-31, 2011-08-31
Inventors:  胡国新;  王晓亮;  冉军学;  肖红领;  殷海波;  张露;  李晋闽
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用于金属有机物化学沉积设备的衬托盘及其制作工艺 专利
专利类型: 发明, 专利号: CN201010033965.2, 公开日期: 2011-08-31
Inventors:  殷海波;  王晓亮;  胡国新;  冉军学;  肖红领;  张露;  李晋闽
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Ⅲ-氮化物半导体材料pn结的制作方法 专利
专利类型: 发明, 专利号: CN200910236706.7, 公开日期: 2011-08-31
Inventors:  冉军学;  王晓亮;  李建平;  胡国新;  肖红领;  王翠梅;  杨翠柏;  李晋闽
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用于金属有机物化学沉积设备的气路装置 专利
专利类型: 发明, 专利号: CN201010033967.1, 公开日期: 2011-08-31
Inventors:  冉军学;  王晓亮;  胡国新;  肖红领;  张露;  殷海波;  李晋闽
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