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Morphological defects and uniformity issues of 4H-SiC homoepitaxial layers grown on off-oriented (0001)Si faces 会议论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, Beijing, PEOPLES R CHINA, SEP 13-19, 2005
作者:  Sun, GS (Sun, G. S.);  Liu, XF (Liu, X. F.);  Gong, QC (Gong, Q. C.);  Wang, L (Wang, L.);  Zhao, WS (Zhao, W. S.);  Li, JY (Li, J. Y.);  Zeng, YP (Zeng, Y. P.);  Li, JM (Li, J. M.);  Sun, GS, Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China. 电子邮箱地址: gshsun@red.semi.ac.cn
Adobe PDF(233Kb)  |  收藏  |  浏览/下载：1211/281  |  提交时间：2010/03/29
4h-sic  
The ICP etching technology of 3C-SiC films 会议论文
INTERNATIONAL MEMS CONFERENCE 2006, 34: 511-515 2006, Singapore, SINGAPORE, MAY 09-12, 2006
作者:  Ning J (Ning Jin);  Gong QC (Gong Quancheng);  Sun GS (Sun Guosheng);  Liu ZL (Liu Zhongli)
Adobe PDF(325Kb)  |  收藏  |  浏览/下载：1653/476  |  提交时间：2011/07/14