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Strain relaxation of GeSi alloy with low dislocation density grown on low-temperature Si buffers 会议论文
JOURNAL OF CRYSTAL GROWTH, 201, CANNES, FRANCE, AUG 31-SEP 04, 1998
作者:  Peng CS;  Chen H;  Zhao ZY;  Li JH;  Dai DY;  Huang Q;  Zhou JM;  Zhang YH;  Tung CH;  Sheng TT;  Wang J;  Peng CS Chinese Acad Sci Inst Phys POB 603 Beijing 100080 Peoples R China.
Adobe PDF(208Kb)  |  收藏  |  浏览/下载：1470/311  |  提交时间：2010/11/15
Threading Dislocation  Si(100)  Layers  Films  
Electrical properties of GaN deposited on nitridated sapphire by molecular beam epitaxy using NH3 cracked on the growing surface 会议论文
JOURNAL OF CRYSTAL GROWTH, 201, CANNES, FRANCE, AUG 31-SEP 04, 1998
作者:  Zhang JP;  Sun DZ;  Li XB;  Wang XL;  Kong MY;  Zeng YP;  Li JM;  Lin LY;  Zhang JP Chinese Acad Sci Inst Semicond POB 912 Beijing 100083 Peoples R China.
Adobe PDF(127Kb)  |  收藏  |  浏览/下载：1315/307  |  提交时间：2010/11/15
Stress  Growth  
The effects of carbonized buffer layer on the growth of SiC on Si 会议论文
JOURNAL OF CRYSTAL GROWTH, 201, CANNES, FRANCE, AUG 31-SEP 04, 1998
作者:  Wang YS;  Li JM;  Zhang FF;  Lin LY;  Wang YS Chinese Acad Sci Inst Semicond Beijing 100083 Peoples R China.
Adobe PDF(160Kb)  |  收藏  |  浏览/下载：1048/244  |  提交时间：2010/11/15
Heteroepitaxial Growth  Hydrocarbon Radicals  Si(001) Surface  Beam