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The transport mechanism of gate leakage current in AlGaN/GaN high electron mobility transistors 期刊论文
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2011, 卷号: 55, 期号: 3, 页码: 30104
Authors:  Lin DF;  Wang XL;  Xiao HL;  Wang CM;  Jiang LJ;  Feng C;  Chen H;  Hou QF;  Deng QW;  Bi Y;  Kang H;  Lin, DF (reprint author), Chinese Acad Sci, Inst Semicond, Ctr Mat Sci, POB 912, Beijing 100083, Peoples R China. dflin@semi.ac.cn
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Gan  
Annealing ambient controlled deep defect formation in InP 期刊论文
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2004, 卷号: 27, 期号: 1-3, 页码: 167-169
Authors:  Zhao, YW;  Dong, ZY;  Duan, ML;  Sun, WR;  Zeng, YP;  Sun, NF;  Sun, TN;  Zhao, YW, Chinese Acad Sci, Inst Semicond, Ctr Mat Sci, POB 912, Beijing 100083, Peoples R China. 电子邮箱地址: zhaoyw@red.semi.ac.nc
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Fe-doped Inp