中文版 | English

在结果中检索

SEMI OpenIR

浏览/检索结果: 共5条，第1-5条 帮助

限定条件    
已选(0)清除 条数/页：   排序方式：
The improvement of thick oxidized porous silicon layer growth process - art. no. 60290S 会议论文
ICO20 Materials and Nanostructures丛书标题: PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE), Changchun, PEOPLES R CHINA, AUG 21-26, 2005
作者:  Li J;  An JM;  Wang HJ;  Xia JL;  Gao DS;  Hu XW;  Li, J, Chinese Acad Sci, Inst Semicond, POB 912, Beijing 100083, Peoples R China.
Adobe PDF(423Kb)  |  收藏  |  浏览/下载：1436/412  |  提交时间：2010/03/29
Porous Silicon  
Silicon thin films prepared in the transition region and their use in solar cells 会议论文
SOLAR ENERGY MATERIALS AND SOLAR CELLS, Bangkok, THAILAND, JAN 27-FEB 01, 2004
作者:  Zhang S;  Liao X;  Raniero L;  Fortunato E;  Xu Y;  Kong G;  Aguas H;  Ferreira I;  Martins R;  Zhang, S, New Univ Lisbon, Fac Sci & Technol, CENIMAT, Dept Mat Sci, P-2829516 Caparica, Portugal. 电子邮箱地址: sz@uninova.pt
Adobe PDF(222Kb)  |  收藏  |  浏览/下载：1613/301  |  提交时间：2010/03/29
Silicon  
High quality microcrystalline Si films by hydrogen dilution profile 会议论文
THIN SOLID FILMS, BRATISLAVA, SLOVAKIA, SEP 15-20, 2002
作者:  Gu, JH (Gu, Jinhua);  Zhu, MF (Zhu, Meifang);  Wang, LJ (Wang, Liujiu);  Liu, FZ (Liu, Fengzhen);  Zhou, BQ (Zhou, Bingqing);  Ding, K (Ding, Kun);  Li, GH (Li, Guohua);  Zhu, MF, Chinese Acad Sci, Grad Sch, Coll Phys Sci, POB 4588, Beijing 100049, Peoples R China. 电子邮箱地址: mfzhu@gucas.ac.cn
Adobe PDF(336Kb)  |  收藏  |  浏览/下载：1178/240  |  提交时间：2010/03/29
Microcrystalline Si Thin Film  
Study on surface morphology of GaN growth by MOCVD on GaN/Si(111) template 会议论文
JOURNAL OF RARE EARTHS, Beijing, PEOPLES R CHINA, OCT 16-19, 2005
作者:  Liu, Z;  Wang, JX;  Wang, XL;  Hu, GX;  Guo, LC;  Liu, HX;  Li, JP;  Li, JM;  Zeng, YP;  Wang, JX, Chinese Acad Sci, Inst Semicond, Novel Mat Lab, Beijing 100083, Peoples R China. 电子邮箱地址: jxwang@red.semi.ac.cn
Adobe PDF(253Kb)  |  收藏  |  浏览/下载：1587/543  |  提交时间：2010/03/29
Surface Morphology  
Growth of high quality semi-insulating InP single crystal by suppression of compensation defects 会议论文
JOURNAL OF RARE EARTHS, Beijing, PEOPLES R CHINA, OCT 16-19, 2005
作者:  Zhao, YW;  Dong, ZY;  Duan, ML;  Sun, WR;  Yang, ZX;  Zhao, YW, Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China. 电子邮箱地址: zhaoyw@red.semi.ac.cn
Adobe PDF(222Kb)  |  收藏  |  浏览/下载：1235/300  |  提交时间：2010/03/29
Indium Phosphide