An Embedded Ultra Low Power Nonvolatile Memory in a Standard CMOS Logic Process
Li, YL (Li, Y-L.); Feng, P (Feng, P.); Wu, NJ (Wu, N-J.); Li, YL, Chinese Acad Sci, State Key Lab Superlattices & Microstruct, Inst Semicond, Beijing 100864, Peoples R China.
2008
会议名称IEEE International Conference of Electron Devices and Solid-State Circuits
会议录名称EDSSC: 2008 IEEE INTERNATIONAL CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS
页码100-103
会议日期DEC 08-10, 2008
会议地点Hong Kong, PEOPLES R CHINA
出版地345 E 47TH ST, NEW YORK, NY 10017 USA
出版者IEEE
ISBN978-1-4244-2539-6
部门归属[li, y-l.; feng, p.; wu, n-j.] chinese acad sci, state key lab superlattices & microstruct, inst semicond, beijing 100864, peoples r china
摘要This paper proposes an embedded ultra low power nonvolatile memory in a standard CMOS logic process. The memory adopts a bit cell based on the differential floating gate PMOS structure and a novel operating scheme. It can greatly improve the endurance and retention characteristic and make the area/bit smaller. A new high efficiency all-PMOS charge pump is designed to reduce the power consumption and to increase the power efficiency. It eliminates the body effect and can generate higher output voltage than conventional structures for a same stage number. A 32-bit prototype chip is fabricated in a 0.18 mu m 1P4M standard CMOS logic process and the core area is 0.06 mm(2). The measured results indicate that the typical write/erase time is 10ms. With a 700 kHz clock frequency, power consumption of the whole memory is 2.3 mu A for program and 1.2 mu A for read at a 1.6V power supply.
关键词Voltage
学科领域微电子学
主办者IEEE.
收录类别CPCI-S
语种英语
文献类型会议论文
条目标识符http://ir.semi.ac.cn/handle/172111/8368
专题中国科学院半导体研究所(2009年前)
通讯作者Li, YL, Chinese Acad Sci, State Key Lab Superlattices & Microstruct, Inst Semicond, Beijing 100864, Peoples R China.
推荐引用方式
GB/T 7714
Li, YL ,Feng, P ,Wu, NJ ,et al. An Embedded Ultra Low Power Nonvolatile Memory in a Standard CMOS Logic Process[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2008:100-103.
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