Study of Si/SiO2 hybrid antireflective coatings on SLD prepared by DSEBET - art. no. 69842P
Sun, MX; Tan, MQ; Zhao, M; Sun, MX, Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China.
2008
会议名称6th International Conference on Thin Film Physics and Applications
会议录名称THIN FILM PHYSICS AND APPLICATIONS,SIXTH INTERNATIONAL CONFERENCE
页码6984: P9842-P9842
会议日期SEP 25-28, 2007
会议地点Shanghai, PEOPLES R CHINA
出版地1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA
出版者SPIE-INT SOC OPTICAL ENGINEERING
ISSN0277-786X
ISBN978-0-8194-7182-6
部门归属[sun, m. x.; tan, m. q.; zhao, m.] chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china
摘要We introduce a double source electron beam evaporation (DSEBET) technique in this paper. The refractive index coatings were fabricated on K9 glass substrate by adjusting the evaporation rates of two independent sources. The coatings, which were described by atomic force microscopy (AFM), show good compactness and homogeneity. The antireflective (AR) coatings were fabricated on Superluminescent Diodes (SLD) by DSEBET. The hybrid AR coatings on the facets of SLD were prepared in evaporation rates of 0.22nm/s and 0.75nm/s for silicon and silicon dioxide, respectively. The results of AFM and spectral performance of coated SLD show that DSEBET has a promising future in preparing the coatings on optoelectronic devices.
关键词Antireflective Coatings Superluminescent Diodes Double Source Electron Beam Evaporation Technology
学科领域光电子学
主办者Shanghai Jiao Tong Univ, Dept Phys.; Natl Nat Sci Fdn China.; Chinese Phys Soc.; Shanghai Phys Soc.; SPIE.
收录类别CPCI-S
语种英语
文献类型会议论文
条目标识符http://ir.semi.ac.cn/handle/172111/7786
专题中国科学院半导体研究所(2009年前)
通讯作者Sun, MX, Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China.
推荐引用方式
GB/T 7714
Sun, MX,Tan, MQ,Zhao, M,et al. Study of Si/SiO2 hybrid antireflective coatings on SLD prepared by DSEBET - art. no. 69842P[C]. 1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA:SPIE-INT SOC OPTICAL ENGINEERING,2008:6984: P9842-P9842.
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