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The impact of implantation dose on the characteristics of diluted-magnetic nonpolar GaN:Cu films
Sun, LL (Sun, Lili); Yan, FW (Yan, Fawang); Zhang, HX (Zhang, Huixiao); Wang, JX (Wang, Junxi); Zeng, YP (Zeng, Yiping); Wang, GH (Wang, Guohong); Li, JM (Li, Jinmin); Sun, LL, Chinese Acad Sci, Inst Semicond, Semicond Lighting Technol Res & Dev Ctr, Beijing 100083, Peoples R China. 电子邮箱地址: lilisun@semi.ac.cn
2009
Source PublicationMATERIALS LETTERS
ISSN0167-577X
Volume63Issue:29Pages:2574-2576
AbstractDiluted-magnetic nonpolar GaN:Cu films have been fabricated by implanting Cu ions into p-type nonpolar a-plane (1120) GaN films with a subsequent thermal annealing process. The impact of the implantation dose on the structural. morphological and magnetic characteristics of the samples have been investigated by means of high-resolution X-ray diffraction (HRXRD). atomic force microscopy (AFM), and superconducting quantum interference device (SQUID). The XRD and AFM analyses show that the structural and morphological characteristics of samples deteriorated with the increase of implantation dose. According to the SQUID analysis. obvious room-temperature ferromagnetic properties of samples were detected. Moreover, the saturation magnetization per Cu atom decreased as the implantation dose increased. (C) 2009 Elsevier B.V. All rights reserved.
metadata_83[sun, lili; yan, fawang; zhang, huixiao; wang, junxi; zeng, yiping; wang, guohong; li, jinmin] chinese acad sci, inst semicond, semicond lighting technol res & dev ctr, beijing 100083, peoples r china; [yan, fawang; zeng, yiping; wang, guohong] yangzhou zhongke semicond lighting r&d ctr co ltd, yangzhou 225100, peoples r china
KeywordDiluted Magnetic Semiconductors (Dmss)
Subject Area半导体材料
Funding OrganizationNatural Science Foundation of China 60876068 SRF 08Y1010000
Indexed BySCI
Language英语
Date Available2010-03-08
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/7561
Collection中国科学院半导体研究所(2009年前)
Corresponding AuthorSun, LL, Chinese Acad Sci, Inst Semicond, Semicond Lighting Technol Res & Dev Ctr, Beijing 100083, Peoples R China. 电子邮箱地址: lilisun@semi.ac.cn
Recommended Citation
GB/T 7714
Sun, LL ,Yan, FW ,Zhang, HX ,et al. The impact of implantation dose on the characteristics of diluted-magnetic nonpolar GaN:Cu films[J]. MATERIALS LETTERS,2009,63(29):2574-2576.
APA Sun, LL .,Yan, FW .,Zhang, HX .,Wang, JX .,Zeng, YP .,...&Sun, LL, Chinese Acad Sci, Inst Semicond, Semicond Lighting Technol Res & Dev Ctr, Beijing 100083, Peoples R China. 电子邮箱地址: lilisun@semi.ac.cn.(2009).The impact of implantation dose on the characteristics of diluted-magnetic nonpolar GaN:Cu films.MATERIALS LETTERS,63(29),2574-2576.
MLA Sun, LL ,et al."The impact of implantation dose on the characteristics of diluted-magnetic nonpolar GaN:Cu films".MATERIALS LETTERS 63.29(2009):2574-2576.
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