SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
1.3微米高密度量子点结构及其制备方法
牛智川; 方志丹; 倪海桥; 韩勤; 龚政; 张石勇; 佟存柱; 彭红玲; 吴东海; 赵欢; 吴荣汉
2006-06-14
Date Available2009-06-04 ; 2009-06-11
Subtype发明
Application Date2004-12-09
Language中文
Application Number200410009992
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/3473
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
牛智川,方志丹,倪海桥,等. 1.3微米高密度量子点结构及其制备方法[P]. 2006-06-14.
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