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Strain tuning of optical emission energy and polarization in monolayer and bilayer MoS2
C. R. Zhu, G. Wang, B. L. Liu, X. Marie, X. F. Qiao, X. Zhang, X. X. Wu, H. Fan, P. H. Tan, T. Amand, and B. Urbaszek
2013
Source PublicationPhys. Rev. B
Volume88Pages:121301
Subject Area半导体物理
Indexed BySCI
Language英语
Date Available2014-03-26
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/24584
Collection半导体超晶格国家重点实验室
Recommended Citation
GB/T 7714
C. R. Zhu, G. Wang, B. L. Liu, X. Marie, X. F. Qiao, X. Zhang, X. X. Wu, H. Fan, P. H. Tan, T. Amand, and B. Urbaszek. Strain tuning of optical emission energy and polarization in monolayer and bilayer MoS2[J]. Phys. Rev. B,2013,88:121301.
APA C. R. Zhu, G. Wang, B. L. Liu, X. Marie, X. F. Qiao, X. Zhang, X. X. Wu, H. Fan, P. H. Tan, T. Amand, and B. Urbaszek.(2013).Strain tuning of optical emission energy and polarization in monolayer and bilayer MoS2.Phys. Rev. B,88,121301.
MLA C. R. Zhu, G. Wang, B. L. Liu, X. Marie, X. F. Qiao, X. Zhang, X. X. Wu, H. Fan, P. H. Tan, T. Amand, and B. Urbaszek."Strain tuning of optical emission energy and polarization in monolayer and bilayer MoS2".Phys. Rev. B 88(2013):121301.
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