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Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography
Geng C (Geng, Chong); Zheng L (Zheng, Lu); Yu J (Yu, Jie); Yan QF (Yan, Qingfeng); Wei TB (Wei, Tongbo); Wang XQ (Wang, Xiaoqing); Shen DZ (Shen, Dezhong)
2012
Source PublicationJOURNAL OF MATERIALS CHEMISTRY
Volume22Issue:42Pages:22678-22685
Subject Area光电子学
Indexed BySCI
Language英语
Date Available2013-04-02
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/23869
Collection集成光电子学国家重点实验室
Recommended Citation
GB/T 7714
Geng C ,Zheng L ,Yu J ,et al. Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography[J]. JOURNAL OF MATERIALS CHEMISTRY,2012,22(42):22678-22685.
APA Geng C .,Zheng L .,Yu J .,Yan QF .,Wei TB .,...&Shen DZ .(2012).Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography.JOURNAL OF MATERIALS CHEMISTRY,22(42),22678-22685.
MLA Geng C ,et al."Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography".JOURNAL OF MATERIALS CHEMISTRY 22.42(2012):22678-22685.
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