SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
砷化镓晶片表面损伤层分析
郑红军; 卜俊鹏; 曹福年; 白玉柯; 吴让元; 惠峰; 何宏家
1999
Source Publication稀有金属
Volume23Issue:4Pages:241
metadata_83中科院半导体所
Subject Area半导体材料
Indexed ByCSCD
Language中文
CSCD IDCSCD:923708
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/18165
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
郑红军,卜俊鹏,曹福年,等. 砷化镓晶片表面损伤层分析[J]. 稀有金属,1999,23(4):241.
APA 郑红军.,卜俊鹏.,曹福年.,白玉柯.,吴让元.,...&何宏家.(1999).砷化镓晶片表面损伤层分析.稀有金属,23(4),241.
MLA 郑红军,et al."砷化镓晶片表面损伤层分析".稀有金属 23.4(1999):241.
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