SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
Polarization-Insensitive Silica on Silicon Arrayed Waveguide Grating Design
An Junming; Li Jian; Gao Dingshan; Xia Junlei; Li Jiangang; Wang Hongjie; Hu Xiongwei
2004
Source Publication半导体学报
Volume25Issue:11Pages:1360-1363
AbstractA new technology for fabrication of silica on silicon arrayed waveguide grating (AWG) based on deep etching and thermal oxidation is presented.Using this method,a silicon layer is remained at the side of waveguide.The stress distribution and effective refractive index of waveguide fabricated by this approach are calculated using finite element and finite difference beam propagation method,respectively.The results of these studies indicate that the stress of silica on silicon optical waveguide can be matched in parallel and vertical direction and AWG polarization dependent wavelength (PDλ) can be reduced effectively due to side-silicon layer.
metadata_83r&d center for optoelectonics,institute of semiconductors,the chinese academy of sciences
Subject Area光电子学
Funding Organization国家重点基础研究发展规划,国家高技术研究发展计划,国家自然科学基金
Indexed ByCSCD
Language英语
CSCD IDCSCD:1799481
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/17291
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
An Junming,Li Jian,Gao Dingshan,et al. Polarization-Insensitive Silica on Silicon Arrayed Waveguide Grating Design[J]. 半导体学报,2004,25(11):1360-1363.
APA An Junming.,Li Jian.,Gao Dingshan.,Xia Junlei.,Li Jiangang.,...&Hu Xiongwei.(2004).Polarization-Insensitive Silica on Silicon Arrayed Waveguide Grating Design.半导体学报,25(11),1360-1363.
MLA An Junming,et al."Polarization-Insensitive Silica on Silicon Arrayed Waveguide Grating Design".半导体学报 25.11(2004):1360-1363.
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