Structural and optical changes in GaAs/InAs/GaAs structure induced by thermal annealing
Mo QW; Fan TW; Gong Q; Wu J; Wang ZG; Bai YQ; Zhang W; Mo QW Chinese Acad Sci Inst Semicond Lab Semicond Mat Sci POB 912 Beijing 100083 Peoples R China.
1998
会议名称5th International Conference on Solid-State and Integrated Circuit Technology
会议录名称1998 5TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY PROCEEDINGS
页码641-644
会议日期OCT 21-23, 1998
会议地点BEIJING, PEOPLES R CHINA
出版地345 E 47TH ST, NEW YORK, NY 10017 USA
出版者IEEE
ISBN0-7803-4306-9
部门归属chinese acad sci, inst semicond, lab semicond mat sci, beijing 100083, peoples r china
摘要Self-organized InAs quantum; dots sheets are grown on GaAs(100) substrate and tapped by 80nm GaAs layer with molecular beam epitaxy. Samples were annealed and characterized with Raman spectra, transmission electron microscopy (TEM) and photolumincscence (PL). The Raman spectra indicates arsenic clusters in the GaAs capping layer. The TEM analysis revealed the relaxation of strain in some InAs islands with the introduction of the network of 90 dislocations. In addition, the structural changes also lead to the changes of the PL spectra from me InAs islands. Their correlation was discussed, Our results suggest:est that annealing may be used to intentionally modify me properties of self-organized InAs islands on GaAs.
关键词Molecular-beam Epitaxy Coherent Islands Gaas Growth Dots Dislocations Temperature Mechanisms Si(001) Ingaas
学科领域半导体材料
主办者Chinese Inst Electr.; IEEE Electron Devices Soc.; IEEE Solid State Circuits Soc.; Japan Soc Appl Phys.; URSI Commiss D.; IEE, Electr Div, UK.; Korea Inst Telemat & Electr.; IEEE Beijing Sect.; Mat Res Soc.; Natl Nat Sci Fdn China.
收录类别CPCI-S
语种英语
文献类型会议论文
条目标识符http://ir.semi.ac.cn/handle/172111/13831
专题中国科学院半导体研究所(2009年前)
通讯作者Mo QW Chinese Acad Sci Inst Semicond Lab Semicond Mat Sci POB 912 Beijing 100083 Peoples R China.
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Mo QW,Fan TW,Gong Q,et al. Structural and optical changes in GaAs/InAs/GaAs structure induced by thermal annealing[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,1998:641-644.
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