SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
A Novel CMOS Color Pixel for Vision Chips
Fu QY (Fu Qiuyu); Zhang WC (Zhang Wancheng); Lin QY (Lin Qingyu); Wu NJ (Wu Nanjian); Fu, QY, Chinese Acad Sci, Inst Semicond, Beijing 10083, Peoples R China
2010-08-16
Conference Name8th IEEE Conference on Sensors
Conference Date2009
Conference PlaceChristchurch, NEW ZEALAND
metadata_24国内
AbstractThis paper presents a novel CMOS color pixel with a 2D metal-grating structure for real-time vision chips. It consists of an N-well/P-substrate diode without salicide and 2D metal-grating layers on the diode. The periods of the 2D metal structure are controlled to realize color filtering. We implemented sixteen kinds of the pixels with the different metal-grating structures in a standard 0.18 mu m CMOS process. The measured results demonstrate that the N-well/P-substrate diode without salicide and with the 2D metal-grating structures can serve as the high speed RGB color active pixel sensor for real-time vision chips well.
Subject Area微电子学
Indexed ByCPCI(ISTP)
Language英语
Document Type会议论文
Identifierhttp://ir.semi.ac.cn/handle/172111/13469
Collection中国科学院半导体研究所(2009年前)
Corresponding AuthorFu, QY, Chinese Acad Sci, Inst Semicond, Beijing 10083, Peoples R China
Recommended Citation
GB/T 7714
Fu QY ,Zhang WC ,Lin QY ,et al. A Novel CMOS Color Pixel for Vision Chips[C],2010.
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